描述
Applied Materials Endura 5500 PVD System (6″/8″)
-
Wafer Type: SNNF
-
Chambers:
-
A: Pass-through
-
B: Cooldown
-
1: Ti NB (missing cryo pump, VAT valve)
-
2: TiN WB (missing cryo pump)
-
3: AlCu NB (missing cryo pump)
-
4: TiN NB (missing cryo pump, VAT valve)
-
D: Pre-Clean II (missing turbo controller, 400K & 13.56M RF generators)
-
E & F: Degas chambers
-
-
Loadlock:
-
Narrow body, auto rotation
-
150mm cassette, WWM mapping
-
Variable speed, fast vent
-
-
Mainframe:
-
Buffer Robot: HP, metal blade
-
XFER Robot: HP+
-
Status tower & remote monitor
-
Missing: transfer chamber cryo pump
-
-
System Rack (208V):
-
Missing: SBC, VGA, OMS, Seri-plex, DI/O & analog boards
-
-
RF I Rack (208V):
-
Missing all DC power supplies and RF generators
-